EUV Tech builds the at-wavelength metrology tools that let the world's chipmakers see what their extreme ultraviolet lithography lines are actually doing. Founded in 1997 and headquartered in Martinez, California, the company supplies reflectometers, pellicle measurement systems, phase-imaging tools and SuMMIT software to every major semiconductor foundry running EUV. In 2023 it raised a Series A led by Intel Capital.
D2S, Inc. is a San Jose-based semiconductor software company that builds GPU-accelerated computational design platforms for photomask manufacturing. Its TrueMask product family turns inverse-lithography and curvilinear designs into mask-writer-ready data, and the company runs the eBeam Initiative, a cross-industry consortium pushing electron-beam lithography forward.
Aki Fujimura is the founder, Chairman, and CEO of D2S, Inc., a San Jose-based semiconductor technology company he started in 2007. Armed with MIT degrees in EECS and over 100 US patents, Fujimura has spent four decades at the sharp edge of semiconductor design automation - co-founding Tangent Systems (acquired by Cadence), serving as President/COO at Simplex Solutions (acquired by Cadence), and incubating new businesses at Cadence before betting on GPU-accelerated curvilinear mask technology at a time when the industry thought it impractical. Today D2S powers the photomask manufacturing pipeline for leading-edge chipmakers worldwide, with over 40 Computational Design Platform installations and a growing body of proof that curvilinear ILT masks deliver dramatically better process windows than conventional Manhattan OPC.