Patrick Naulleau

Patrick Naulleau is the CEO of EUV Tech Inc., a Martinez, California-based company leading the development of at-wavelength extreme ultraviolet (EUV) metrology tools for semiconductor manufacturing. With over 25 years of pioneering work in EUV lithography — including helping build the world's first EUV scanner at Lawrence Berkeley National Laboratory and co-developing the SHARP EUV mask microscope — Naulleau transitioned from world-class researcher to industry CEO in 2022. He holds a PhD in Electrical Engineering from the University of Michigan, is a Fellow of both Optica and SPIE, and has authored over 400 publications. EUV Tech raised a $36M Series A led by Intel Capital in 2023.