# Patrick Naulleau

> Patrick Naulleau is the CEO of EUV Tech Inc., a Martinez, California-based company leading the development of at-wavelength extreme ultraviolet (EUV) metrology tools for semiconductor manufacturing. With over 25 years of pioneering work in EUV lithography — including helping build the world's first EUV scanner at Lawrence Berkeley National Laboratory and co-developing the SHARP EUV mask microscope — Naulleau transitioned from world-class researcher to industry CEO in 2022. He holds a PhD in Electrical Engineering from the University of Michigan, is a Fellow of both Optica and SPIE, and has authored over 400 publications. EUV Tech raised a $36M Series A led by Intel Capital in 2023.

- **Role:** CEO at EUV Tech Inc.
- **Organizations:** EUV Tech Inc., Lawrence Berkeley National Laboratory (LBNL), Center for X-Ray Optics (CXRO), Optica (OSA), SPIE
- **Nationality:** American
- **Education:** B.S. in Electrical Engineering, Rochester Institute of Technology, M.S. in Electrical Engineering, Rochester Institute of Technology, Ph.D. in Electrical Engineering (optical signal processing and coherence theory), University of Michigan, Ann Arbor
- **Known for:** Over 400 peer-reviewed publications with 5,196+ citations, 20 patents in EUV and optical technologies, Fellow of Optica (formerly OSA)

## Career timeline

- **1991** — Earned B.S. in Electrical Engineering from Rochester Institute of Technology
- **1993** — Earned M.S. in Electrical Engineering from Rochester Institute of Technology
- **1997** — Earned Ph.D. in Electrical Engineering from University of Michigan, Ann Arbor
- **1997** — Joined Lawrence Berkeley National Laboratory (LBNL) on the EUV LLC program, working on the world's first EUV scanner
- **2005** — Served as Associate Professor at University at Albany, SUNY, focusing on EUV lithography
- **2010** — Became Director of the Center for X-Ray Optics (CXRO) at Lawrence Berkeley National Laboratory
- **2014** — Co-developed SHARP (SEMATECH Berkeley Actinic Inspection Tool), the world's first high-NA EUV mask microscope
- **2022** — Appointed CEO of EUV Tech Inc.
- **2023** — Led EUV Tech's $36M Series A funding round, backed by Intel Capital and In-Q-Tel
- **2024** — EUV Tech began facility expansion in Martinez, CA; invited speaker at EIPBN 2024 and SEMICON conferences

## Achievements

- Over 400 peer-reviewed publications with 5,196+ citations
- 20 patents in EUV and optical technologies
- Fellow of Optica (formerly OSA)
- Fellow of SPIE
- Advanced Light Source Halbach Prize for Instrumentation
- Federal Laboratory Excellence in Technology Transfer Award
- Two R&D 100 Awards
- Co-developed SHARP - the world's first high-NA EUV mask microscope at Berkeley Lab
- Led development of the world's first high-NA patterning tool at CXRO/LBNL
- Helped build the world's first EUV scanner on the EUV LLC program (1997)
- Led EUV Tech's $36M Series A fundraise from Intel Capital and In-Q-Tel

## Latest updates

- **2024-02** — EUV Tech broke ground on expanded manufacturing and warehouse facilities in Martinez, CA
- **2024-01** — Patrick Naulleau invited as speaker at EIPBN 2024 and SEMICON conferences
- **2023-03** — EUV Tech completed $36M Series A funding round led by Intel Capital and In-Q-Tel
- **2022-08** — Patrick Naulleau announced as CEO of EUV Tech Inc.

## Links

- Website: https://euvtech.com
- LinkedIn: http://www.linkedin.com/in/patrick-naulleau-6358713

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Profile page: https://yespress.io/patrick-naulleau
Published by YesPress — https://yespress.io
Last updated: 2026-05-24